Title page for etd-0728107-011313


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URN etd-0728107-011313
Author Wei-hsun Shu
Author's Email Address m943010068@student.nsysu.edu.tw
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Department Electrical Engineering
Year 2006
Semester 2
Degree Master
Type of Document
Language zh-TW.Big5 Chinese
Title Electrodeposition of Diamond-Like Carbon Films
Date of Defense 2007-07-20
Page Count 88
Keyword
  • DLC
  • electrodeposition
  • MIS
  • Abstract Diamond-Like Carbon (DLC)films were successfully deposited on the ITO substrate by electrodeposition technique. This method has several advantages in terms of low cost, rapid growth rates and simple setup. Electrodeposition of DLC thin film was carried out at low DC potential by using a mixture of acetic acid and DI water as electrolyte. The Raman spectra showed two peaks located at 1350cm-1 and 1580cm-1, which were the characterized peaks for DLC films deposited on ITO substrates. By varying the experimental parameters such as the deposited DC potential, distance of electrodes, and the concentrations of solution, the growth mechanism of deposition process was investigated, and the best quality of DLC films was also achieved. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to make insight into accurately the surface morphology of DLC films related to deposited parameters
    In addition, according to the experimental results, it indicates that the quality of the DLC film was improved as deposited at higher DC voltage. Finally, to demonstrate the effect of annealing on the interfacial characteristics the C-V and G-V curves of MIS structures are the further works.
    Advisory Committee
  • Wei-Chou Hsu - chair
  • Chih-hsiung Liao - co-chair
  • Yeu-Long Jiang - co-chair
  • Uerng-Yih Ueng - advisor
  • Files
  • etd-0728107-011313.pdf
  • indicate not accessible
    Date of Submission 2007-07-28

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